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CrSi2 Chromium Silicide
Chromium disilicide
Application of chromium disilicide in the preparation of ceramic materials by
pyrolysis of Polycarbosilane as precursor
Chromium disilicide powder can promote the cracking reaction of PCs,
increase the ceramic yield of the precursor, reduce the linear shrinkage of the
precursor in the pyrolysis process, and improve the properties of ceramic materials.
The main uses of chromium silicide are as follows
It can be used as ceramic material and high resistance film material.
The product properties of chromium silicide are as follows
Chromium silicide film has high resistivity and low resistance temperature coefficient.
Gray cubic crystal, hexagonal system, melting point close to 1550 ℃, the bonding
form in crystal is similar to Cr3Si, metallic luster, insoluble in hydrochloric acid and
aqua regia.
Chromium silicide film has high resistivity and low resistance temperature coefficient.